Rectangular polysilicon nanowires by top-down lithography, dry etch and metal-induced lateral crystallization

Electrochemical and Solid-State Letters

Volumn 15, Issue 3, 2012, Pages

  Sun, Kai ^a   Hakim, M M A ^a   Ashburn, P ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DISPOSABLE BIOSENSOR; DRY-ETCH; FABRICATION PROCESS; GLASS SUBSTRATES; LOW COSTS; LOW TEMPERATURE POLY-SILICON; METAL-INDUCED LATERAL CRYSTALLIZATION; POLYSILICON NANOWIRES; REACTIVE ION ETCH; SILICON DEPOSITION; TOPDOWN;

BIOSENSORS; NANOWIRES; POLYSILICON; SUBSTRATES;

AMORPHOUS SILICON;

EID: 84855948561     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.011203esl     Document Type: Article

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