Field electron emission from individual diamond cone formed by plasma etching

Applied Physics Letters

Volumn 89, Issue 6, 2006, Pages

  Wang, Q ^a   Wang, Z L ^a   Li, J J ^a   Huang, Y ^a   Li, Y L ^a   Gu, C Z ^a   Cui, Z ^b  

^a INSTITUTE OF PHYSICS   (China)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; ELECTRON EMISSION; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SPUTTERING;

DIAMOND CONES; FIELD ELECTRON EMISSION; SURFACE WORK FUNCTIONS; WORK FUNCTION STABILIZATION;

DIAMONDS;

EID: 33747144105     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2266991     Document Type: Article

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