Scaling down lateral dimensions of silicon nanopillars fabricated by reactive ion etching with Au/Cr self-assembled clusters as an etch mask

Thin Solid Films

Volumn 520, Issue 6, 2012, Pages 2041-2045

  Kaliasas, R ^a   Baltrusaitis, J ^b   Mikolajunas, M ^a   Jakucionis L ^c   Virzonis D ^a  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

^b UNIVERSITY OF IOWA   (United States)

^c Laboratory of Micro and Nano Technologies   (Lithuania)

Author keywords

Chromium; Gold; Nanopillars; Reactive ion etching; Thin films

Indexed keywords

ATOMIC DIAMETER; ETCH MASK; ETCHING MASKS; FABRICATION PROCESS; LATERAL DIMENSION; NANODOTS; NANOELECTRONIC DEVICES; NANOPILLAR STRUCTURES; NANOPILLARS; SCALING DOWN; SELF-ASSEMBLED CLUSTERS;

ASPECT RATIO; CHROMIUM; FABRICATION; GOLD; GOLD COMPOUNDS; IONS; NANOELECTRONICS; PHOTONIC CRYSTALS; SCANNING ELECTRON MICROSCOPY; SURFACE PLASMON RESONANCE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE ION ETCHING;

EID: 84855950095     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.10.021     Document Type: Article

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