Highly selective isotropic dry etch based nanofabrication

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 4, 2007, Pages 1416-1419

  Hussain, Muhammad Mustafa ^a   Gebara, Gabriel ^b   Sassman, Barry ^a   Lanee, Sidi ^b   Larson, Larry ^a  

^a SEMATECH   (United States)

^b Advanced Technology Development Facility   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; MICROELECTRONICS; NANOWIRES; THIN FILMS;

ISOTROPIC DRY ETCH; NANOWIRE TITANIUM NITRIDES; THIN SOLID FILMS;

NANOTECHNOLOGY;

EID: 34547606846     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2756544     Document Type: Article

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