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EPJ Applied Physics

Volumn 55, Issue 1, 2011, Pages

Evolution of high aspect ratio and nano-grass structures using a modified low plasma density reactive ion etching

(5) Mehran, M a Kolahdouz, Z a Sanaee, Z a Azimi, S a Mohajerzadeh, S a

a UNIVERSITY OF TEHRAN (Iran)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP REACTIVE ION ETCHING; ETCHING PARAMETERS; ETCHING TECHNIQUE; HIGH ASPECT RATIO; NANOSTRUCTURED SURFACE; PLASMA POWER; RF PLASMA; SILICON SUBSTRATES; SILICON SURFACES; VERTICAL STRUCTURES; WETABILITY;

ASPECT RATIO; CARBON NANOTUBES; OIL SPILLS; PASSIVATION; PLASMA DENSITY; SULFUR HEXAFLUORIDE;

REACTIVE ION ETCHING;

EID: 80051959802 PISSN: 12860042 EISSN: 12860050 Source Type: Journal
DOI: 10.1051/epjap/2011100362 Document Type: Conference Paper

Times cited : (6)

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