Deep reactive ion etching: A promising technology for micro-and nanosatellites

Smart Materials and Structures

Volumn 10, Issue 6, 2001, Pages 1135-1144

  Ayon A A ^a   Bayt, R L ^b   Breuer, K S ^c  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b UNITED TECHNOLOGIES RESEARCH CENTER   (United States)

^c BROWN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; PLASMA ETCHING; PROPULSION; SATELLITES; SPACE RESEARCH;

DEEP REACTIVE ION ETCHING (DRIE); LOW-THRUST PROPULSION SYSTEMS;

REACTIVE ION ETCHING;

EID: 0035673373     PISSN: 09641726     EISSN: None     Source Type: Journal    
DOI: 10.1088/0964-1726/10/6/302     Document Type: Article

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