Advanced plasma etch technologies for nanopatterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8328, Issue , 2012, Pages

  Wise, Rich ^a  

^a IBM RESEARCH   (United States)

Author keywords

atomic layer etch; defectivity; plasma etch; sidewall image transfer; surface integrity

Indexed keywords

ATOMIC LAYER; DEFECTIVITY; PLASMA ETCH; SIDEWALL IMAGE TRANSFERS; SURFACE INTEGRITY;

INFORMATION TECHNOLOGY; PLASMAS;

PLASMA STABILITY;

EID: 84875169611     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.920307     Document Type: Conference Paper

References (9)

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