A survey on the reactive ion etching of silicon in microtechnology

Journal of Micromechanics and Microengineering

Volumn 6, Issue 1, 1996, Pages 14-28

  Jansen, Henri ^a   Gardeniers, Han ^a   De Boer, Meint ^a   Elwenspoek, Miko ^a   Fluitman, Jan ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; MASKS; PASSIVATION; PLASMA ETCHING; SEMICONDUCTING SILICON;

PLASMA SYSTEM CONFIGURATIONS;

REACTIVE ION ETCHING;

EID: 0030091527     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/6/1/002     Document Type: Review

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