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Volumn 519, Issue 11, 2011, Pages 3792-3797

Broadband and wide-angle antireflection subwavelength structures of Si by inductively coupled plasma etching using dewetted nanopatterns of Au thin films as masks

(2) Leem, J W a Yu, J S a

a Kyung Hee University (South Korea)

Author keywords

Antireflection property; Au nanoparticles; Dewetting process; ICP etching; Subwavelength structures

Indexed keywords

ANTI-REFLECTION; AU NANOPARTICLE; DEWETTING PROCESS; ICP ETCHING; SUBWAVELENGTH STRUCTURES;

INDUCTIVELY COUPLED PLASMA; NANOPARTICLES; OPTIMIZATION; REACTIVE ION ETCHING; REFLECTION; SILICON; SURFACE PHENOMENA; THIN FILMS;

GOLD;

EID: 79952737791 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.12.248 Document Type: Article

Times cited : (29)

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