Fabrication and reflection properties of silicon nanopillars by cesium chloride self-assembly and dry etching

Applied Surface Science

Volumn 258, Issue 22, 2012, Pages 8825-8830

  Liu, Jing ^a,b   Ashmkhan, Marina ^a,b   Wang, Bo ^a   Yi, Futing ^a  

^a INSTITUTE OF HIGH ENERGY PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Etching time; Nanoislands; Nanopillars; Reflectance

Indexed keywords

ASPECT RATIO; CHLORINE COMPOUNDS; DRY ETCHING; FABRICATION; HUMIDITY CONTROL; INDUCTIVELY COUPLED PLASMA; NANOSTRUCTURES; PROCESS CONTROL; REFLECTION; SELF ASSEMBLY; SILICA; SILICON OXIDES; THERMOOXIDATION;

AVERAGE DIAMETER; ETCHING TIME; HIGH ASPECT RATIO; NANO-ISLANDS; NANOPILLARS; REFLECTION PROPERTIES; SILICON NANOPILLARS; THERMAL OXIDATION PROCESS;

CESIUM COMPOUNDS;

EID: 84863514374     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.05.099     Document Type: Article

References (18)

1. 2 photoelectrochemical cells Nano Letters 11 2002 1259 1261
2. A.M. Popa, B. Wenger, E. Scolan, G. Voirin, H. Heinzelmann, and R. Pugin Nanostructured waveguides for evanescent wave biosensor Applied Surface Science 256S 2009 S12 S17
3. M. Green, E. Fielder, B. Scrosati, M. Wachtler, and J.S. Morenob Structured silicon anodes for lithium battery applications Electrochemical Solid-State Letters 6 2003 A75 A79
4. L.F. Sun, and J.Y. Tang A new texturing technique of monocrystalline silicon surface with sodium hypochlorite Applied Surface Science 255 2009 9301 9304
5. J.Y. Chen, and K.W. Sun Enhancement of the light conversion efficiency of silicon solar cells by using nanoimprint anti-reflection layer Solar Energy Materials and Solar Cells 94 2010 629 633
6. Z.N. Yu, H. Gao, W. Wu, H.X. Ge, and S.Y. Chou Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff Journal of Vacuum Science and Technology B 21 2003 2874 2878
7. Y. Kanamori, M. Sasaki, and K. Hane Broadband antireflection gratings fabricated upon silicon substrates Optics Letters 24 1999 1422 1424
8. K. Hadobás, S. Kirsch, A. Carl, M. Acet, and E.F. Wassermann Reflection properties of nanostructure-arrayed silicon surfaces Nanotechnology 11 2000 161 164
9. C.L. Cheung, R.J. Nikolić, C.E. Reinhardt, and T.F. Wang Fabrication of nanopillars by nanosphere lithography Nanotechnology 17 2006 1339 1343
10. W. Li, L. Xu, W.-M. Zhao, P. Sun, X.-F. Huang, and K.-J. Chen Fabrication of large-scale periodic silicon nanopillar arrays for 2D nanomold using modified nanosphere lithography Applied Surface Science 253 2007 9035 9038
11. W. Sen, Y.X. Zheng, and F.H. Tao Simple lithographic approach for subwavelength structure antireflection Applied Physics Letters 91 2007 061105
12. J.W. Leem, K.S. Chung, and J.S. Yu Antireflective properties of disordered Si SWSs with hydrophobic surface by thermally dewetted Pt nanomask patterns for Si-based solar cells Current Applied Physics 12 2012 291 298
13. H. Sai, H. Fujii, K. Arafune, Y. Ohshita, M. Yamaguchi, Y. Kanamori, and H. Yugami Antireflective subwavelength structures on crystalline Si fabricated using directly formed anodic porous alumina masks Applied Physics Letters 88 2006 201116
14. J. Liu, Y.-X. Liao, B. Wang, and F.-T. Yi The fabrication and photoelectric properties of the nanopillar arrays for solar cell Materials Science Forum 694 2011 375 379
15. Y.-X. Liao, and F.-T. Yi Nanopillars by cesium chloride self-assembly and dry etching Nanotechnology 21 2010 465302
16. Y.-X. Liao, J. Liu, B. Wang, and F.-T. Yi Multiform structures with silicon nanopillars by cesium chloride self-assembly and dry etching Applied Surface Science 257 2011 10489 10493
17. M. Green, and S. Tsuchiya Mesoscopic hemisphere arrays for use as resist in solid state structure fabrication Journal of Vacuum Science and Technology B 17 1999 2074 2083
18. Y. Ono, Y. Kimura, Y. Ohta, and N. Nishida Antireflection effect in ultrahigh spatial-frequency holographic relief gratings Applied Optics 26 1987 1142 1146