Ti/TiN coatings for microfabricated cantilevers used in atomic force microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 3, 2000, Pages 1182-1186

  Wiederhold, K P ^a   Yamaguchi, Y ^a   Ayala, A ^a   Matheaus, M ^a   Gutierrez, C J ^a   Galloway, H C ^a  

^a TEXAS STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CERAMIC COATINGS; METALLIC FILMS; SILICON; SPUTTER DEPOSITION; STRESS RELIEF; TITANIUM; TITANIUM NITRIDE;

MICROFABRICATED CANTILEVERS;

PROBES;

EID: 0034187090     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591356     Document Type: Article

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