Chemical gases sensing properties of diamond nanocone arrays formed by plasma etching

Journal of Applied Physics

Volumn 102, Issue 10, 2007, Pages

  Wang, Q ^a   Qu, S L ^a   Fu, S Y ^a   Liu, W J ^a   Li, J J ^b   Gu, C Z ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; CHEMICAL VAPOR DEPOSITION; HYDROGENATION; OXIDATION; PLASMA ETCHING; REACTIVE ION ETCHING;

DIAMOND NANOCONE ARRAYS; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD);

DIAMOND FILMS;

EID: 36749055786     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2817465     Document Type: Article

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