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Physica E: Low-Dimensional Systems and Nanostructures

Volumn 43, Issue 10, 2011, Pages 1902-1905

Highly efficient field emission from nanodiamond films treated by fast reactive ion etching process

(5) Tian, Shibing a Li, Yunlong a Xia, Xiaoxiang a Gu, Changzhi a Li, Junjie a

a INSTITUTE OF PHYSICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIAMOND NANOPARTICLES; DISTRIBUTION DENSITY; ELECTRON FIELD EMISSION PROPERTIES; EMISSION PERFORMANCE; ETCHING MASKS; FIELD ENHANCEMENT FACTOR; NANOCRYSTALLINE DIAMOND FILMS; NANODIAMOND FILMS; NCD FILMS; REACTIVE ION; TREATMENT METHODS;

ASPECT RATIO; DIAMONDS; FIELD EMISSION; MORPHOLOGY; NANONEEDLES;

REACTIVE ION ETCHING;

EID: 79961168939 PISSN: 13869477 EISSN: None Source Type: Journal
DOI: 10.1016/j.physe.2011.06.036 Document Type: Article

Times cited : (7)

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