CH4/H2 plasma etching of IV-VI semiconductor nanostructures

Semiconductor Science and Technology

Volumn 14, Issue 2, 1999, Pages

  Schwarzl, Th ^a   Heiss W ^a   Kocher Oberlehner, G ^a   Springholz, G ^a  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ENERGY GAP; EUROPIUM; HYDROGEN; METHANE; NANOSTRUCTURED MATERIALS; PLASMA ETCHING; SEMICONDUCTING LEAD COMPOUNDS; SEMICONDUCTOR LASERS; SEMICONDUCTOR QUANTUM WIRES;

LASER HOLOGRAPHY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033076373     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/14/2/003     Document Type: Article

References (17)

1. Katzir A, Rosman R, Shani Y, Bachem K H, Böttner H and Preier H M 1989 Handbook of Solid State Lasers ed P K Cheo (New York: Dekker) p 228
2. Zogg H, Blunier St, Hoshino T, Maissen C, Masek J and Tiwari AN 1991 IEEE Trans. Electron Devices 38 1110
3. Grabecki G, Wrobel J, Dietl T, Sawicki M, Skoskiewicz T, Papis E, Kaminska E. Piotrowska A, Frank N, Uety Y, Springholz G and Bauer G 1996 Acta Phys. Pol. A 90 797
4. Pinczolits M, Springholz G and Bauer G 1998 Appl. Phys. Lett. 73 250
5. Feit Z, Kostyk D, Woods R J and Mak P 1990 Appl. Phys. Lett. 57 2891 Feit Z, Kostyk D, Woods R J and Mak P 1990 J. Vac. Sci. Technol. B 8 200
6. Feit Z, Kostyk D, Woods R J and Mak P 1990 Appl. Phys. Lett. 57 2891 Feit Z, Kostyk D, Woods R J and Mak P 1990 J. Vac. Sci. Technol. B 8 200
7. Feit Z, McDonald M, Woods R J, Archambault V and Mak P 1996 Appl. Phys. Lett 68 738
8. Cheung R, Thorns S, Beamont S P, Doughty G, Law V and Wilkinson C D W 1987 Electron. Lett. 23 857
9. Henry L and Vaudry C 1987 Electron. Lett. 23 1253
10. Foad M A, Wilkinson C D W, Dunscomb C and Wiliarns R H 1992 Appl. Phys. Lett. 60 2531
11. Garvin H L, Carmine E, Somekh S, Stoll H and Yarvi A 1973 Appl. Opt. 12 455
12. -5.9.
13. Semu A and Silverberg P 1991 Semicond. Sci. Technol. 6 287
14. Toyoda H, Kojima H and Sugai H 1989 Appl. Phys. Lett. 54 1507
15. Hayes T R, Dreisbach M A, Thomas P M, Dautremont-Smith W C and Heimbrook L A 1989 J. Vac. Sci. Technol. B 7 1130
16. Semu A, Montelius L, Leech P, Jamieson D and Silverberg P 1991 Appl. Phys. Lett. 59 1752
17. Neswahl M, Greßlehner K H, Lischka K, Bauer P, Brandstötter A, Lübke K 1993 Mater. Sci. Eng. B 16 108