High-rate and smooth surface etching of Al2O3-TiC employing Inductively Coupled Plasma (ICP)

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 4 SUPPL. B, 1996, Pages 2512-2515

  Fukushima, Nobuto ^a   Katai, Hiroaki ^b   Wada, Toshiaki ^c   Horiike, Yasuhiro ^b  

^a CITIZEN WATCH CO LTD   (Japan)

^b TOYO UNIVERSITY   (Japan)

^c HITACHI CABLE LTD   (Japan)

Author keywords

ICP; Ion bombardment; Magnetic head; RIE; Slider

Indexed keywords

ALUMINA; ARGON; CHLORINE COMPOUNDS; DRY ETCHING; ION BOMBARDMENT; MORPHOLOGY; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SURFACE ROUGHNESS; TITANIUM CARBIDE; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

BORON TRICHLORIDE; INDUCTIVELY COUPLED PLASMA; NEGATIVE PRESSURE CAVITY SLIDER; SMOOTH SURFACE ETCHING; TRANSVERSE PRESSURE CONTOUR SLIDER;

PLASMA ETCHING;

EID: 0030122463     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.2512     Document Type: Article

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