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Volumn 13, Issue 4, 2003, Pages 271-276

Reactive ion etching of cylindrical polyferrocenylsilane block copolymer micelles: Fabrication of ceramic nanolines on semiconducting substrates

(8) Cao, Lan a Massey, Jason A a Winnik, Mitchell A a Manners, Ian a Riethmüller, Silke b Banhart, Florian b Spatz, Joachim P b Möller, Martin b

a UNIVERSITY OF TORONTO (Canada)

b UNIVERSITY OF ULM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MICELLES; REACTIVE ION ETCHING; SELF ASSEMBLY; SIZE EXCLUSION CHROMATOGRAPHY; SPIN COATING; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING SUBSTRATES;

BLOCK COPOLYMERS;

EID: 0037509853 PISSN: 1616301X EISSN: None Source Type: Journal
DOI: 10.1002/adfm.200304261 Document Type: Article

Times cited : (106)

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