Reactive ion etching of diamond in O2 and CF4 plasma, and fabrication of porous diamond for field emitter cathodes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7745-7748

  Shiomi, Hiromu ^a  

^a SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

Author keywords

Diamond; Field emission; Porous material; Reactive ion etching (RIE)

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; FIELD EMISSION CATHODES; FILM GROWTH; PLASMA ETCHING; POLYCRYSTALLINE MATERIALS; POROUS MATERIALS; REACTIVE ION ETCHING; SYNTHETIC DIAMONDS;

POROUS DIAMOND;

SEMICONDUCTING DIAMONDS;

EID: 0031382197     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7745     Document Type: Article

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