Strain engineering of silicon-germanium (SiGe) micro- and nanostructures

Silicon-Germanium (SiGe) Nanostructures

Volumn , Issue , 2011, Pages 247-295

  Pezzoli, F ^a   Deneke, C ^b   Schmidt, O G ^b  

^a UNIVERSITY OF MILANO BICOCCA   (Italy)

^b IFW DRESDEN   (Germany)

Author keywords

Ge islands; Self organization; Semiconductor nanostructures; SiGe alloys; Strain engineering

Indexed keywords

FIELD EFFECT TRANSISTORS; GERMANIUM; NANOSTRUCTURES; SILICON ALLOYS;

ENERGY HARVESTING DEVICE; GE ISLAND; MICRO AND NANOSTRUCTURES; MORPHOLOGICAL EVOLUTION; PROCESS TECHNOLOGIES; SELF ORGANIZATIONS; SEMICONDUCTOR NANOSTRUCTURES; STRAIN ENGINEERING;

SI-GE ALLOYS;

EID: 84903034915     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1533/9780857091420.2.247     Document Type: Chapter

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