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Applied Physics A: Materials Science and Processing

Volumn 67, Issue 6, 1998, Pages 675-685

Self-organized nanostructures in Si1-xGex films on Si(001)

(3) Teichert, C a,b,d Bean, J C c,e Lagally, M G a

a University of Wisconsin Madison (United States)

b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS (Germany)

c NOKIA RESEARCH CENTER (United States)

d UNIVERSITY OF LEOBEN (Austria)

e University of Virginia (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISLOCATIONS (CRYSTALS); ELASTICITY; FILM GROWTH; METALLIC FILMS; MORPHOLOGY; MULTILAYERS; NANOSTRUCTURED MATERIALS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILICON WAFERS; STRAIN; STRESS RELAXATION;

ISLAND GROWTH; SILICON GERMANIDE; STEP BUNCHING; STRANSKI-KRASTANOV GROWTH;

SEMICONDUCTING FILMS;

EID: 0032302886 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390050839 Document Type: Article

Times cited : (82)

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