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Volumn 85, Issue 17, 2000, Pages 3672-3675
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Pathway for the strain-driven two-dimensional to three-dimensional transition during growth of Ge on Si(001)
a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
ATOMIC FORCE MICROSCOPY;
MOLECULAR BEAM EPITAXY;
MORPHOLOGY;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SCANNING TUNNELING MICROSCOPY;
SEMICONDUCTING GERMANIUM;
SEMICONDUCTING SILICON;
SEMICONDUCTOR GROWTH;
SURFACE STRUCTURE;
THREE DIMENSIONAL;
TWO DIMENSIONAL;
GAS SOURCE MOLECULAR BEAM EPITAXY;
MORPHOLOGICAL TRANSITION;
STRAIN DRIVEN TRANSITION;
TWO DIMENSIONAL TO THREE DIMENSIONAL TRANSITION;
PHASE TRANSITIONS;
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EID: 0034297559
PISSN: 00319007
EISSN: None
Source Type: Journal
DOI: 10.1103/PhysRevLett.85.3672 Document Type: Article |
Times cited : (202)
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References (29)
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