Impact of template variations on shape and arrangement of SiGe quantum dot arrays

Applied Physics Letters

Volumn 92, Issue 14, 2008, Pages

  Dais, C ^a   Solak, H H ^a   Muller E ^a,c   Grutzmacher D ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; ETCHING; LITHOGRAPHY; SEMICONDUCTING SILICON COMPOUNDS; SIZE DISTRIBUTION; TEMPLATE MATCHING;

ETCHED PITS; MULTIPLE STACKING; TEMPLATE VARIATIONS; ULTRAVIOLET INTERFERENCE LITHOGRAPHY;

SEMICONDUCTOR QUANTUM DOTS;

EID: 42149162291     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2907196     Document Type: Article

References (18)

1. Z. Zhong, A. Halilovic, M. Mühlberger, F. Schäffler, and G. Bauer, Appl. Phys. Lett. 82, 4779 (2003).
2. D. Grützmacher, T. Fromherz, C. Dais, J. Stangl, E. Müller, Y. Ekinci, H. H. Solak, H. Sigg, R. Lechner, E. Wintersberger, S. Birner, V. Holy, and G. Bauer, Nano Lett. 7, 3150 (2007).
3. T. Stoica, V. Shushunova, C. Dais, H. H. Solak, and D. Grützmacher, Nanotechnology 18, 455307 (2007).
4. I. Berbezier and A. Ronda, Phys. Rev. B 75, 195407 (2007).
5. O. G. Schmidt, A. Rastelli, and G. S. Kar, Physica E (Amsterdam) 25, 280 (2004).
6. O. G. Schmidt and K. Eberl, IEEE Trans. Electron Devices 48, 1175 (2001).
7. M. Friesen, P. Rugheimer, D. E. Savage, M. G. Lagally, D. W. van der Weide, R. Joynt, and M. A. Eriksson, Phys. Rev. B 67, 121301 (2003).
8. H. Malissa, W. Jantsch, W. Mühlberger, F. Schäffler, Z. Wilamowski, M. Draxler, and G. Bauer, Appl. Phys. Lett. 85, 1739 (2004).
9. D. Kitayama, T. Yoichi, and Y. Sud, Thin Solid Films 508, 203 (2006).
10. G. L. Snider, A. O. Orlov, I. Amlani, X. Zuo, G. H. Bernstein, C. S. Lent, J. L. Merz, and W. Porod, J. Appl. Phys. 85, 4283 (1999).
11. J. L. Gray, S. Atha, R. Hull, and J. Floro, Nano Lett. 4, 2447 (2004).
12. Z. Zhong, O. G. Schmidt, and G. Bauer, Appl. Phys. Lett. 87, 133111 (2005).
13. H. H. Solak, C. David, and J. Gobrecht, Microelectron. Eng. 67-68, 56 (2003).
14. H. H. Solak, J. Phys. D 39, R171 (2006).
15. G. Biasol, A. Gustafsson, K. Leifer, and E. Kapon, Phys. Rev. B 65, 205306 (2002).
16. G. Chen, H. Lichtenberger, G. Bauer, W. Jantsch, and F. Schäffler, Phys. Rev. B 74, 035302 (2006).
17. O. G. Schmidt, O. Kienzle, Y. Hao, K. Eberl, and F. Ernst, Appl. Phys. Lett. 74, 1272 (1999).
18. J. Tersoff, C. Teichert, and M. G. Lagally, Phys. Rev. Lett. 76, 1675 (1996).