Controllable fabrication of SiGe/Si and SiGe/Si/Cr helical nanobelts

Nanotechnology

Volumn 16, Issue 6, 2005, Pages 655-663

  Zhang, L ^a   Deckhardt, E ^a   Weber, A ^a   Schonenberger C ^b   Grutzmacher D ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b UNIVERSITY OF BASEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; CHEMICAL VAPOR DEPOSITION; CHROMIUM; ELECTRON BEAM LITHOGRAPHY; HETEROJUNCTIONS; MOLECULAR BEAM EPITAXY; NANOSTRUCTURED MATERIALS; REACTIVE ION ETCHING;

MESA PATTERNS; PLANAR FILMS; VOLUME RATIOS; WET CHEMICAL ETCHING;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 18744388569     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/6/006     Document Type: Article

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