A new technique for fabricating three-dimensional micro- and nanostructures of various shapes

Nanotechnology

Volumn 12, Issue 4, 2001, Pages 399-402

  Prinz, V Ya ^a,b   Grutzmacher D ^a   Beyer, A ^a   David, C ^a   Ketterer, B ^a   Deckardt, E ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; ETCHING; HETEROJUNCTIONS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; STRAIN; SUBSTRATES;

THREE-DIMENSIONAL MICROSTRUCTURES;

NANOSTRUCTURED MATERIALS;

EID: 0035673567     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/12/4/301     Document Type: Conference Paper

References (8)