Optical actuation of micromirrors fabricated by the micro-origami technique

Applied Physics Letters

Volumn 83, Issue 18, 2003, Pages 3647-3649

  Zanardi, José M ^a   Vaccaro, Pablo O ^a   Fleischmann, Thomas ^a   Wang, Te Sheng ^a   Kubota, Kazuyoshi ^a   Aida, Tahito ^a   Ohnishi, Toshiaki ^b   Sugimura, Akira ^b   Izumoto, Ryo ^c   Hosoda, Makoto ^c   Nashima, Shigeki ^c  

^a ADVANCED TELECOMMUNICATIONS RESEARCH INSTITUTE INTERNATIONAL   (Japan)

^b KONAN UNIVERSITY   (Japan)

^c Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MICROOPTICS; MOLECULAR BEAM EPITAXY; MULTILAYERS; RELAXATION PROCESSES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; SEMICONDUCTOR DEVICE MANUFACTURE; STRAIN RATE; SUBSTRATES;

ALUMINUM GALLIUM ARSENIDE; CONTINUOUS WAVE IRRADIATION; LATTICE MISMATCHED EPITAXIAL LAYERS; MICRO-ORIGAMI TECHNIQUE; MICROMIRRORS; OPTICAL ACTUATION; OPTICAL EXCITATION; SELECTIVE ETCHING; STRAIN RELAXATION;

MIRRORS;

EID: 0344117989     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1622800     Document Type: Article

References (10)

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