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Physical Review Letters

Volumn 101, Issue 21, 2008, Pages

Kinetically suppressed ostwald ripening of Ge/Si(100) hut clusters

(3) McKay, Michael R a,d Venables, J A b,c Drucker, Jeff b

a Arizona State University (United States)

b ARIZONA STATE UNIVERSITY (United States)

c UNIVERSITY COLLEGE LONDON (United Kingdom)

d Lawrence Semiconduct Res Lab (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; CRYSTAL GROWTH; GERMANIUM; OSTWALD RIPENING; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING GERMANIUM COMPOUNDS; SUPERSATURATION;

CRITICAL NUCLEUS SIZES; HUT CLUSTERS; ISLAND GROWTHS; LOW AREAS; NUCLEATION AND GROWTH MODELS; TEMPERATURE ANNEALS;

GROWTH (MATERIALS);

EID: 56849125514 PISSN: 00319007 EISSN: 10797114 Source Type: Journal
DOI: 10.1103/PhysRevLett.101.216104 Document Type: Article

Times cited : (41)

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