Metal ALD and pulsed CVD: Fundamental reactions and links with solution chemistry

Coordination Chemistry Reviews

Volumn 257, Issue 23-24, 2013, Pages 3282-3296

  Emslie, David J H ^a   Chadha, Preeti ^a   Price, Jeffrey S ^a  

^a MCMASTER UNIVERSITY   (Canada)

Author keywords

iPr; nBu; sBu; tBu; Acac; AES; ALD; Allyl; AllylR2; AllylR; AmdR,R'; AmdR; CHD; CMOS; COD; COT; Cp; Cp'; CpEt; CVD; Dmamb; Dppe; DRAM; Et; Fod; Hfac; IPSA; IR; ITO; LIALD; LICVD; Me; Metal deposition; MIM; MOS; Nacnaccycle R,R'; NacnacR; NHC; Od; OTf; PEALD; Ph; Pin; Pulsed CVD; PVD; PyrImR; QCM; QMS; Reaction pathways; SAM; Solution studies; TEM; TFEL; Thd; UHAR; UHV; VTMS; XPS

Indexed keywords

EID: 84885664174     PISSN: 00108545     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ccr.2013.07.010     Document Type: Review

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