SCOPUS 정보 검색 플랫폼

Journal of Materials Chemistry

Volumn 18, Issue 30, 2008, Pages 3521-3526

The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturing

(1) Zaera, Francisco a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; ATOMS; CAPILLARITY; CHEMICAL VAPOR DEPOSITION; CHEMISTRY; MICROELECTRONIC PROCESSING; MICROELECTRONICS; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; SURFACE CHEMISTRY; THICK FILMS;

ATOMIC LAYER DEPOSITION (ATL); CONFORMAL FILMS; ELECTRONIC DEVICES; FILM DEPOSITION; MILD CONDITIONS; ROYAL SOCIETY OF CHEMISTRY (RSC); UNDERLYING SURFACE; WIDESPREAD USE;

ATOMIC LAYER DEPOSITION;

EID: 47749141558 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/b803832e Document Type: Article

Times cited : (114)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.