Studies of metallic thin film growth in an atomic layer epitaxy reactor using M(acac)2 (M = Ni, Cu, Pt) precursors

Applied Surface Science

Volumn 157, Issue 3, 2000, Pages 151-158

  Utriainen, Mikko ^a   Kröger Laukkanen, Minna ^a   Johansson, Leena Sisko ^a   Niinistö, Lauri ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ALUMINUM; COPPER; DEPOSITION; FILM GROWTH; HYDROGEN; NICKEL; NICKEL COMPOUNDS; PLATINUM; REDUCTION; SILICON; TITANIUM;

ATOMIC LAYER EPITAXY (ALE); DIKETONATE-TYPE PRECURSOR;

METALLIC FILMS;

EID: 0342323747     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00562-0     Document Type: Article

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