Surface science investigations of atomic layer deposition half-reactions using TaF5 and Si2H6

Surface Science

Volumn 538, Issue 3, 2003, Pages 191-203

  Lemonds, A M ^a   White, J M ^b   Ekerdt, J G ^a  

^a The University of Texas at Austin   (United States)

^b University of Texas at Austin   (United States)

Author keywords

Growth; Halides; Hydrides; Molecule solid reactions; Secondary ion mass spectroscopy; Surface chemical reaction; Tantalum; X ray photoelectron spectroscopy

Indexed keywords

ADSORPTION; ASYMPTOTIC STABILITY; POLYCRYSTALLINE MATERIALS; SECONDARY ION MASS SPECTROMETRY; SILICON COMPOUNDS; ULTRAHIGH VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

TANTALUM COMPOUNDS;

EID: 0038449334     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00729-5     Document Type: Article

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