Comparison of the agglomeration behavior of thin metallic films on Si O2

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 1152-1161

  Gadkari, P R ^a   Warren, A P ^a   Todi, R M ^a   Petrova, R V ^a   Coffey, K R ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GATE ENGINEERING; METALLIC THIN FILMS; POLYCRYSTALLINE THIN FILMS;

AGGLOMERATION; GATES (TRANSISTOR); GOLD; MICROSTRUCTURE; PLATINUM; POLYCRYSTALLINE MATERIALS; SILICA; SURFACE STRUCTURE; THIN FILMS;

METALLIC FILMS;

EID: 31044446088     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1861943     Document Type: Conference Paper

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