-
1
-
-
0035440735
-
-
a) C. U. Pinnow, I. Kasko, C. Dehm, B. Jobst, M. Seibt, U. Geyer, J. Vac. Sci. Technol., B 2001, 19, 1857.
-
(2001)
J. Vac. Sci. Technol., B
, vol.19
, pp. 1857
-
-
Pinnow, C.U.1
Kasko, I.2
Dehm, C.3
Jobst, B.4
Seibt, M.5
Geyer, U.6
-
2
-
-
0033718135
-
-
b) Y.-M. Sun, X.-M. Yan, N. Mettlach, J. P. Endle, P. D. Kirsch, J. G. Ekerdt, S. Madhukar, R. L. Hance, J. M. White, J. Vac. Sci. Technol., A. 2000, 18, 10.
-
(2000)
J. Vac. Sci. Technol., A
, vol.18
, pp. 10
-
-
Sun, Y.-M.1
Yan, X.-M.2
Mettlach, N.3
Endle, J.P.4
Kirsch, P.D.5
Ekerdt, J.G.6
Madhukar, S.7
Hance, R.L.8
White, J.M.9
-
3
-
-
36449005098
-
-
a) T. Nakamura, Y. Nakao, A. Kamisawa, H. Takasu, Appl. Phys. Lett. 1994, 65, 1522.
-
(1994)
Appl. Phys. Lett.
, vol.65
, pp. 1522
-
-
Nakamura, T.1
Nakao, Y.2
Kamisawa, A.3
Takasu, H.4
-
4
-
-
0000388685
-
-
b) Y. J. Song, H. H. Kim, S. Y. Lee, D. J. Jung, B. J. Koo, J. K. Lee, Y. S. Park, H. J. Cho, S. O. Park, K. Kim, Appl. Phys. Lett. 2000, 76, 451.
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 451
-
-
Song, Y.J.1
Kim, H.H.2
Lee, S.Y.3
Jung, D.J.4
Koo, B.J.5
Lee, J.K.6
Park, Y.S.7
Cho, H.J.8
Park, S.O.9
Kim, K.10
-
5
-
-
3242725305
-
-
E. Slavcheva, R. Vitushinsky, W. Mokwa, U. Schnakenberg. J. Electrochem. Soc. 2004, 151, E226.
-
(2004)
J. Electrochem. Soc.
, vol.151
-
-
Slavcheva, E.1
Vitushinsky, R.2
Mokwa, W.3
Schnakenberg, U.4
-
8
-
-
0027594230
-
-
a) N. V. Gelfond, F. V. Tuzikov, I. K. Igumenov, Thin Solid Films 1993, 227, 144.
-
(1993)
Thin Solid Films
, vol.227
, pp. 144
-
-
Gelfond, N.V.1
Tuzikov, F.V.2
Igumenov, I.K.3
-
9
-
-
0033149709
-
-
b) Y.-M. Sun, J. P. Endle, K. Smith, S. Whaley, R. Mahaffy, J. G. Ekerdt, J. M. White, R. L. Hance, Thin Solid Films 1999, 346, 100.
-
(1999)
Thin Solid Films
, vol.346
, pp. 100
-
-
Sun, Y.-M.1
Endle, J.P.2
Smith, K.3
Whaley, S.4
Mahaffy, R.5
Ekerdt, J.G.6
White, J.M.7
Hance, R.L.8
-
10
-
-
0001495177
-
-
J. B. Hoke, E. W. Stern, H. H. Murray, J. Mater. Chem. 1991, 1, 551.
-
(1991)
J. Mater. Chem.
, vol.1
, pp. 551
-
-
Hoke, J.B.1
Stern, E.W.2
Murray, H.H.3
-
11
-
-
0003072387
-
-
P. Serp, R. Feurer, P. Kalck, H. Gomes, J. L. Faria, J. L. Figueiredo, Chem. Vap. Deposition 2001, 7, 59.
-
(2001)
Chem. Vap. Deposition
, vol.7
, pp. 59
-
-
Serp, P.1
Feurer, R.2
Kalck, P.3
Gomes, H.4
Faria, J.L.5
Figueiredo, J.L.6
-
12
-
-
0035372046
-
-
a) J. P. Endle, Y.-M. Sun, N. Nguyen, S. Madhukar, R. L. Hance, J. M. White, J. G. Ekerdt, Thin Solid Films 2001, 388, 126.
-
(2001)
Thin Solid Films
, vol.388
, pp. 126
-
-
Endle, J.P.1
Sun, Y.-M.2
Nguyen, N.3
Madhukar, S.4
Hance, R.L.5
White, J.M.6
Ekerdt, J.G.7
-
13
-
-
20444480688
-
-
b) F. Zhang, R. Barrowcliff, G. Stecker, W. Pan, D. Wang, S.-T. Hsu, Jpn. J. Appl. Phys., Part 2 2005, 44, L398.
-
(2005)
Jpn. J. Appl. Phys., Part 2
, vol.44
-
-
Zhang, F.1
Barrowcliff, R.2
Stecker, G.3
Pan, W.4
Wang, D.5
Hsu, S.-T.6
-
14
-
-
0001597819
-
-
C. Xu, T. H. Baum, A. L. Rheingold, Chem. Mater. 1998, 10, 2329.
-
(1998)
Chem. Mater.
, vol.10
, pp. 2329
-
-
Xu, C.1
Baum, T.H.2
Rheingold, A.L.3
-
15
-
-
0002451171
-
-
Y.-L. Chen, C.-S. Liu, Y. Chi, A. J. Carty, S.-M. Peng, G.-H. Lee, Chem. Vap. Deposition 2002, 8, 17.
-
(2002)
Chem. Vap. Deposition
, vol.8
, pp. 17
-
-
Chen, Y.-L.1
Liu, C.-S.2
Chi, Y.3
Carty, A.J.4
Peng, S.-M.5
Lee, G.-H.6
-
17
-
-
0002265210
-
-
a) Y. Chi, S. Ranjan, P.-W. Chung, C.-S. Liu, S.-M. Peng, G.-H. Lee, J. Chem. Soc. Dalton Trans. 2000, 343.
-
(2000)
J. Chem. Soc. Dalton Trans.
, pp. 343
-
-
Chi, Y.1
Ranjan, S.2
Chung, P.-W.3
Liu, C.-S.4
Peng, S.-M.5
Lee, G.-H.6
-
18
-
-
0012881081
-
-
b) Y. Chi, S. Ranjan, P.-W. Chung, H.-Y. Hsieh, S.-M. Peng, G.-H. Lee, Inorg. Chim. Acta 2002, 334, 172.
-
(2002)
Inorg. Chim. Acta
, vol.334
, pp. 172
-
-
Chi, Y.1
Ranjan, S.2
Chung, P.-W.3
Hsieh, H.-Y.4
Peng, S.-M.5
Lee, G.-H.6
-
19
-
-
0142042540
-
-
R.-S. Chen, Y.-S. Huang, Y.-M. Liang, D.-S. Tsai, Y. Chi, J.-J. Kai, J. Mater. Chem. 2003, 13, 2525.
-
(2003)
J. Mater. Chem.
, vol.13
, pp. 2525
-
-
Chen, R.-S.1
Huang, Y.-S.2
Liang, Y.-M.3
Tsai, D.-S.4
Chi, Y.5
Kai, J.-J.6
-
20
-
-
0036939671
-
-
a) Y. Chi, P.-F. Hsu, C.-S. Liu, W.-L. Ching, T.-Y. Chou, A. J. Carty, S.-M. Peng, G.-H. Lee, S.-H. Chuang, J. Mater. Chem. 2002, 12, 3541.
-
(2002)
J. Mater. Chem.
, vol.12
, pp. 3541
-
-
Chi, Y.1
Hsu, P.-F.2
Liu, C.-S.3
Ching, W.-L.4
Chou, T.-Y.5
Carty, A.J.6
Peng, S.-M.7
Lee, G.-H.8
Chuang, S.-H.9
-
21
-
-
26944492131
-
-
b) E. Lay, V.-H. Song, Y.-C. Chiu, Y.-M. Lin, Y. Chi, A. J. Carty, S.-M. Peng, G.-H. Lee, Inorg. Chem. 2005, 44, 7226.
-
(2005)
Inorg. Chem.
, vol.44
, pp. 7226
-
-
Lay, E.1
Song, V.-H.2
Chiu, Y.-C.3
Lin, Y.-M.4
Chi, Y.5
Carty, A.J.6
Peng, S.-M.7
Lee, G.-H.8
-
22
-
-
0009580420
-
-
R. Ugo, G. La Monica, S. Cenini, F. Bonati, J. Organomet. Chem. 1968, 11, 159.
-
(1968)
J. Organomet. Chem.
, vol.11
, pp. 159
-
-
Ugo, R.1
La Monica, G.2
Cenini, S.3
Bonati, F.4
-
23
-
-
0000271515
-
-
J.-C. Hierso, P. Serp, R. Feurer, P. Kalck, Appl. Organomet. Chem. 1998, 12, 161.
-
(1998)
Appl. Organomet. Chem.
, vol.12
, pp. 161
-
-
Hierso, J.-C.1
Serp, P.2
Feurer, R.3
Kalck, P.4
-
24
-
-
1642609110
-
-
R.-S. Chen, Y.-S. Chen, Y.-S. Huang, Y.-L. Chen, Y. Chi, C.-S. Liu, K.-K. Tiong, A. J. Carty, Chem. Vap. Deposition 2003, 9, 301.
-
(2003)
Chem. Vap. Deposition
, vol.9
, pp. 301
-
-
Chen, R.-S.1
Chen, Y.-S.2
Huang, Y.-S.3
Chen, Y.-L.4
Chi, Y.5
Liu, C.-S.6
Tiong, K.-K.7
Carty, A.J.8
-
25
-
-
7544234584
-
-
a) R. S. Chen, Y. S. Huang, Y. M. Liang, D. S. Tsai, K. K. Tiong, J. Alloys Compd. 2004, 383, 273.
-
(2004)
J. Alloys Compd.
, vol.383
, pp. 273
-
-
Chen, R.S.1
Huang, Y.S.2
Liang, Y.M.3
Tsai, D.S.4
Tiong, K.K.5
-
26
-
-
4944237528
-
-
b) R. S. Chen, H. M. Chang, Y. S. Huang, D. S. Tsai, S. Chattopadhyay, K. H. Chen, J. Cryst. Growth 2004, 271, 105.
-
(2004)
J. Cryst. Growth
, vol.271
, pp. 105
-
-
Chen, R.S.1
Chang, H.M.2
Huang, Y.S.3
Tsai, D.S.4
Chattopadhyay, S.5
Chen, K.H.6
-
27
-
-
2942589058
-
-
c) R.-S. Chen, Y.-S. Huang, D.-S. Tsai, S. Chattopadhyay, C.-T. Wu, Z.-H. Lan, K.-H. Chen, Chem. Mater. 2004, 16, 2457.
-
(2004)
Chem. Mater.
, vol.16
, pp. 2457
-
-
Chen, R.-S.1
Huang, Y.-S.2
Tsai, D.-S.3
Chattopadhyay, S.4
Wu, C.-T.5
Lan, Z.-H.6
Chen, K.-H.7
-
28
-
-
12344320176
-
-
R.-S. Chen, H.-M. Chang, Y.-S. Huang, D.-S. Tsai, K.-C. Chiu, Nanotechnology 2005, 16, 93.
-
(2005)
Nanotechnology
, vol.16
, pp. 93
-
-
Chen, R.-S.1
Chang, H.-M.2
Huang, Y.-S.3
Tsai, D.-S.4
Chiu, K.-C.5
-
29
-
-
0001503617
-
-
a) H.-L. Yu, Y. Chi, C.-S. Liu, S.-M. Peng, G.-H. Lee, Chem. Vap. Deposition 2001, 7, 245.
-
(2001)
Chem. Vap. Deposition
, vol.7
, pp. 245
-
-
Yu, H.-L.1
Chi, Y.2
Liu, C.-S.3
Peng, S.-M.4
Lee, G.-H.5
-
30
-
-
0038459255
-
-
b) Y.-H. Lai, T.-Y. Chou, Y.-H. Song, C.-S. Liu, Y. Chi, A. J. Carty, S.-M. Peng, G.-H. Lee, Chem. Mater. 2003, 15, 2454.
-
(2003)
Chem. Mater.
, vol.15
, pp. 2454
-
-
Lai, Y.-H.1
Chou, T.-Y.2
Song, Y.-H.3
Liu, C.-S.4
Chi, Y.5
Carty, A.J.6
Peng, S.-M.7
Lee, G.-H.8
-
31
-
-
3142761724
-
-
c) T.-Y. Chou, Y.-H. Lai, Y.-L. Chen, Y. Chi, K. R. Prasad, A. J. Carty, S.-M. Peng, G.-H. Lee, Chem. Vap. Deposition 2004, 10, 149.
-
(2004)
Chem. Vap. Deposition
, vol.10
, pp. 149
-
-
Chou, T.-Y.1
Lai, Y.-H.2
Chen, Y.-L.3
Chi, Y.4
Prasad, K.R.5
Carty, A.J.6
Peng, S.-M.7
Lee, G.-H.8
|