-
1
-
-
0344667722
-
Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges
-
Leskelä, M.; Ritala, M. Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges Angew. Chem., Int. Ed. 2003, 42, 5548-5554
-
(2003)
Angew. Chem., Int. Ed.
, vol.42
, pp. 5548-5554
-
-
Leskelä, M.1
Ritala, M.2
-
2
-
-
75649140552
-
Atomic Layer Deposition: An Overview
-
George, S. M. Atomic Layer Deposition: An Overview Chem. Rev. 2010, 110, 111-131
-
(2010)
Chem. Rev.
, vol.110
, pp. 111-131
-
-
George, S.M.1
-
3
-
-
21744444606
-
Surface Chemistry of Atomic Layer Deposition: A Case Study for the Trimethylaluminum/Water Process
-
Puurunen, R. L. Surface Chemistry of Atomic Layer Deposition: A Case Study for the Trimethylaluminum/Water Process J. Appl. Phys. 2005, 97, 1-52
-
(2005)
J. Appl. Phys.
, vol.97
, pp. 1-52
-
-
Puurunen, R.L.1
-
4
-
-
47749141558
-
The Surface Chemistry of Thin Film Atomic Layer Deposition (ALD) Processes for Electronic Device Manufacturing
-
Zaera, F. The Surface Chemistry of Thin Film Atomic Layer Deposition (ALD) Processes for Electronic Device Manufacturing J. Mater. Chem. 2008, 18, 3521-3526
-
(2008)
J. Mater. Chem.
, vol.18
, pp. 3521-3526
-
-
Zaera, F.1
-
5
-
-
0006277949
-
Low-Temperature Laser Deposition of Tungsten by Silane- and Disilane-Assisted Reactions
-
Black, J. G.; Doran, S. P.; Rothschild, M.; Ehrlich, D. J. Low-Temperature Laser Deposition of Tungsten by Silane- and Disilane-Assisted Reactions Appl. Phys. Lett. 1990, 56, 1072-1074
-
(1990)
Appl. Phys. Lett.
, vol.56
, pp. 1072-1074
-
-
Black, J.G.1
Doran, S.P.2
Rothschild, M.3
Ehrlich, D.J.4
-
6
-
-
0034140916
-
Atomic Layer Deposition of Tungsten Using Sequential Surface Chemistry with a Sacrificial Stripping Reaction
-
Klaus, J. W.; Ferro, S. J.; George, S. M. Atomic Layer Deposition of Tungsten Using Sequential Surface Chemistry with a Sacrificial Stripping Reaction Thin Solid Films 2000, 360, 145-153
-
(2000)
Thin Solid Films
, vol.360
, pp. 145-153
-
-
Klaus, J.W.1
Ferro, S.J.2
George, S.M.3
-
7
-
-
0029732685
-
Batch Reactor Kinetic Studies of Tungsten LPCVD from Silane and Tungsten Hexafluoride
-
Bell, D. A.; McConica, C. M.; Baker, K. L.; Kuchta, E. Batch Reactor Kinetic Studies of Tungsten LPCVD from Silane and Tungsten Hexafluoride J. Electrochem. Soc. 1996, 143, 296-302
-
(1996)
J. Electrochem. Soc.
, vol.143
, pp. 296-302
-
-
Bell, D.A.1
McConica, C.M.2
Baker, K.L.3
Kuchta, E.4
-
8
-
-
0025434270
-
Atmospheric Pressure Chemical Vapor Deposition of Tungsten Silicide
-
Dobkin, D.; Bartholomew, L.; McDaniel, G.; DeDontney, J. Atmospheric Pressure Chemical Vapor Deposition of Tungsten Silicide J. Electrochem. Soc. 1990, 137, 1623-1626
-
(1990)
J. Electrochem. Soc.
, vol.137
, pp. 1623-1626
-
-
Dobkin, D.1
Bartholomew, L.2
McDaniel, G.3
Dedontney, J.4
-
14
-
-
33750812549
-
Organometallic Precursors for Atomic Layer Deposition
-
Putkonen, M.; Niinistö, L. Organometallic Precursors for Atomic Layer Deposition Top. Organomet. Chem. 2005, 9, 125-145
-
(2005)
Top. Organomet. Chem.
, vol.9
, pp. 125-145
-
-
Putkonen, M.1
Niinistö, L.2
-
15
-
-
0345448389
-
Synthesis and Characterization of Volatile, Thermally Stable, Reactive Transition Metal Amidinates
-
Lim, B. S.; Rahtu, A.; Park, J. S.; Gordon, R. G. Synthesis and Characterization of Volatile, Thermally Stable, Reactive Transition Metal Amidinates Inorg. Chem. 2003, 42, 7951-7958
-
(2003)
Inorg. Chem.
, vol.42
, pp. 7951-7958
-
-
Lim, B.S.1
Rahtu, A.2
Park, J.S.3
Gordon, R.G.4
-
16
-
-
34948880168
-
Mechanistic Details of Atomic Layer Deposition (ALD) Processes
-
Xu, M.; Tiznado, H.; Kang, B.-C.; Bouman, M.; Lee, I.; Zaera, F. Mechanistic Details of Atomic Layer Deposition (ALD) Processes J. Korean Phys. Soc. 2007, 51, 1063-1068
-
(2007)
J. Korean Phys. Soc.
, vol.51
, pp. 1063-1068
-
-
Xu, M.1
Tiznado, H.2
Kang, B.-C.3
Bouman, M.4
Lee, I.5
Zaera, F.6
-
17
-
-
75249107159
-
Uptake of Copper Acetamidinate ALD Precursors on Nickel Surfaces
-
Ma, Q.; Guo, H.; Gordon, R. G.; Zaera, F. Uptake of Copper Acetamidinate ALD Precursors on Nickel Surfaces Chem. Mater. 2010, 22, 352-359
-
(2010)
Chem. Mater.
, vol.22
, pp. 352-359
-
-
Ma, Q.1
Guo, H.2
Gordon, R.G.3
Zaera, F.4
-
18
-
-
79960537802
-
Surface Chemistry of Copper(I) Acetamidinates in Connection with Atomic Layer Deposition (ALD) Processes
-
Ma, Q.; Guo, H.; Gordon, R. G.; Zaera, F. Surface Chemistry of Copper(I) Acetamidinates in Connection with Atomic Layer Deposition (ALD) Processes Chem. Mater. 2011, 23, 3325-3334
-
(2011)
Chem. Mater.
, vol.23
, pp. 3325-3334
-
-
Ma, Q.1
Guo, H.2
Gordon, R.G.3
Zaera, F.4
-
19
-
-
84855570872
-
Thermal Chemistry of Copper(I)- N, N ′-di- sec -butylacetamidinate on Cu(110) Single-Crystal Surfaces
-
Ma, Q.; Zaera, F.; Gordon, R. G. Thermal Chemistry of Copper(I)- N, N ′-di- sec -butylacetamidinate on Cu(110) Single-Crystal Surfaces J. Vac. Sci. Technol. A 2012, 30, 01A114
-
(2012)
J. Vac. Sci. Technol. A
, vol.30
-
-
Ma, Q.1
Zaera, F.2
Gordon, R.G.3
-
21
-
-
38949206831
-
Mechanistic Details of Atomic Layer Deposition (ALD) Processes for Metal Nitride Film Growth
-
Tiznado, H.; Bouman, M.; Kang, B.-C.; Lee, I.; Zaera, F. Mechanistic Details of Atomic Layer Deposition (ALD) Processes for Metal Nitride Film Growth J. Mol. Catal. A 2008, 281, 35-43
-
(2008)
J. Mol. Catal. A
, vol.281
, pp. 35-43
-
-
Tiznado, H.1
Bouman, M.2
Kang, B.-C.3
Lee, I.4
Zaera, F.5
-
22
-
-
79952562480
-
The Surface Chemistry of Atomic Layer Deposition (ALD) Processes for Metal Nitride and Metal Oxide Film Growth
-
Bouman, M.; Zaera, F. The Surface Chemistry of Atomic Layer Deposition (ALD) Processes for Metal Nitride and Metal Oxide Film Growth ECS Trans. 2010, 33, 291-305
-
(2010)
ECS Trans.
, vol.33
, pp. 291-305
-
-
Bouman, M.1
Zaera, F.2
-
23
-
-
80051744284
-
Reductive Eliminations from Amido Metal Complexes: Implications for Metal Film Deposition
-
Bouman, M.; Zaera, F. Reductive Eliminations from Amido Metal Complexes: Implications for Metal Film Deposition J. Electrochem. Soc. 2011, 158, D524-D526
-
(2011)
J. Electrochem. Soc.
, vol.158
-
-
Bouman, M.1
Zaera, F.2
-
24
-
-
79955062152
-
Indium Oxide Atomic Layer Deposition Facilitated by the Synergy between Oxygen and Water
-
Libera, J. A.; Hryn, J. N.; Elam, J. W. Indium Oxide Atomic Layer Deposition Facilitated by the Synergy between Oxygen and Water Chem. Mater. 2011, 23, 2150-2158
-
(2011)
Chem. Mater.
, vol.23
, pp. 2150-2158
-
-
Libera, J.A.1
Hryn, J.N.2
Elam, J.W.3
-
25
-
-
18244426116
-
2 Gate Dielectrics Deposited Via Tetrakis Diethylamido Hafnium
-
2 Gate Dielectrics Deposited Via Tetrakis Diethylamido Hafnium J. Electrochem. Soc. 2003, 150, F67-F74
-
(2003)
J. Electrochem. Soc.
, vol.150
-
-
Schaeffer, J.1
Edwards, N.V.2
Liu, R.3
Roan, D.4
Hradsky, B.5
Gregory, R.6
Kulik, J.7
Duda, E.8
Contreras, L.9
Christiansen, J.10
-
26
-
-
33645644068
-
2 Thin Films Grown by Metal-Organic CVD Using Tetrakis(diethylamido)hafnium
-
2 Thin Films Grown by Metal-Organic CVD Using Tetrakis(diethylamido) hafnium Chem. Vap. Depostion 2006, 12, 130-135
-
(2006)
Chem. Vap. Depostion
, vol.12
, pp. 130-135
-
-
Ohshita, Y.1
Ogura, A.2
Ishikawa, M.3
Kada, T.4
Hoshino, A.5
Suzuki, T.6
MacHida, H.7
Soai, K.8
-
30
-
-
52649138379
-
2Zr(OMe)Me and Water or Ozone
-
2Zr(OMe)Me and Water or Ozone Chem. Mater. 2008, 20, 5698-5705
-
(2008)
Chem. Mater.
, vol.20
, pp. 5698-5705
-
-
Knapas, K.1
Ritala, M.2
-
31
-
-
79955417265
-
Surface Chemistry of Pentakis(dimethylamido)tantalum on Ta Surfaces
-
Kim, T.; Zaera, F. Surface Chemistry of Pentakis(dimethylamido)tantalum on Ta Surfaces J. Phys. Chem. C 2011, 115, 8240-8247
-
(2011)
J. Phys. Chem. C
, vol.115
, pp. 8240-8247
-
-
Kim, T.1
Zaera, F.2
-
32
-
-
0242583886
-
Atomic Layer Deposition of Transition Metals
-
Lim, B. S.; Rahtu, A.; Gordon, R. G. Atomic Layer Deposition of Transition Metals Nat. Mater. 2003, 2, 749-754
-
(2003)
Nat. Mater.
, vol.2
, pp. 749-754
-
-
Lim, B.S.1
Rahtu, A.2
Gordon, R.G.3
-
33
-
-
80052406562
-
Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges
-
Profijt, H. B.; Potts, S. E.; van de Sanden, M. C. M.; Kessels, W. M. M. Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges J. Vac. Sci. Technol., A 2011, 29, 050801-050826
-
(2011)
J. Vac. Sci. Technol., A
, vol.29
, pp. 050801-050826
-
-
Profijt, H.B.1
Potts, S.E.2
Van De Sanden, M.C.M.3
Kessels, W.M.M.4
-
34
-
-
4243910579
-
An Organometallic Guide to the Chemistry of Hydrocarbon Moieties on Transition Metal Surfaces
-
Zaera, F. An Organometallic Guide to the Chemistry of Hydrocarbon Moieties on Transition Metal Surfaces Chem. Rev. 1995, 95, 2651-2693
-
(1995)
Chem. Rev.
, vol.95
, pp. 2651-2693
-
-
Zaera, F.1
-
35
-
-
33745805902
-
Organic Chemistry on Solid Surfaces
-
Ma, Z.; Zaera, F. Organic Chemistry on Solid Surfaces Surf. Sci. Rep. 2006, 61, 229-281
-
(2006)
Surf. Sci. Rep.
, vol.61
, pp. 229-281
-
-
Ma, Z.1
Zaera, F.2
-
36
-
-
64349109641
-
3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry
-
3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry J. Phys. Chem. C 2008, 112, 19530-19539
-
(2008)
J. Phys. Chem. C
, vol.112
, pp. 19530-19539
-
-
Goldstein, D.N.1
McCormick, J.A.2
George, S.M.3
-
37
-
-
45749104689
-
Detection of a Formate Surface Intermediate in the Atomic Layer Deposition of High- k Dielectrics Using Ozone
-
Kwon, J.; Dai, M.; Halls, M. D.; Chabal, Y. J. Detection of a Formate Surface Intermediate in the Atomic Layer Deposition of High- k Dielectrics Using Ozone Chem. Mater. 2008, 20, 3248-3250
-
(2008)
Chem. Mater.
, vol.20
, pp. 3248-3250
-
-
Kwon, J.1
Dai, M.2
Halls, M.D.3
Chabal, Y.J.4
-
38
-
-
77957951107
-
2
-
2 ACS Appl. Mater. Interfaces 2010, 2, 347-350
-
(2010)
ACS Appl. Mater. Interfaces
, vol.2
, pp. 347-350
-
-
Rose, M.1
Niinistö, J.2
Endler, I.3
Bartha, J.W.4
Kücher, P.5
Ritala, M.6
-
39
-
-
0041916147
-
Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum
-
Aaltonen, T.; Rahtu, A.; Ritala, M.; Leskelä, M. Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum Electrochem. Solid State Lett. 2003, 6, C130-C133
-
(2003)
Electrochem. Solid State Lett.
, vol.6
-
-
Aaltonen, T.1
Rahtu, A.2
Ritala, M.3
Leskelä, M.4
-
41
-
-
67650470258
-
Surface Reactions during Atomic Layer Deposition of Pt Derived from Gas Phase Infrared Spectroscopy
-
Kessels, W. M. M.; Knoops, H. C. M.; Dielissen, S. A. F.; Mackus, A. J. M.; van de Sanden, M. C. M. Surface Reactions During Atomic Layer Deposition of Pt Derived from Gas Phase Infrared Spectroscopy Appl. Phys. Lett. 2009, 95, 013114
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 013114
-
-
Kessels, W.M.M.1
Knoops, H.C.M.2
Dielissen, S.A.F.3
MacKus, A.J.M.4
Van De Sanden, M.C.M.5
-
42
-
-
77951250075
-
Atomic Layer Deposition of Ir-Pt Alloy Films
-
Christensen, S. T.; Elam, J. W. Atomic Layer Deposition of Ir-Pt Alloy Films Chem. Mater. 2010, 22, 2517-2525
-
(2010)
Chem. Mater.
, vol.22
, pp. 2517-2525
-
-
Christensen, S.T.1
Elam, J.W.2
-
44
-
-
0033739843
-
Effect of Water Dose on the Atomic Layer Deposition Rate of Oxide Thin Films
-
Matero, R.; Rahtu, A.; Ritala, M.; Leskelä, M.; Sajavaara, T. Effect of Water Dose on the Atomic Layer Deposition Rate of Oxide Thin Films Thin Solid Films 2000, 368, 1-7
-
(2000)
Thin Solid Films
, vol.368
, pp. 1-7
-
-
Matero, R.1
Rahtu, A.2
Ritala, M.3
Leskelä, M.4
Sajavaara, T.5
-
45
-
-
27344444688
-
In-Situ Infrared Spectroscopy and Density Functional Theory Modeling of Hafnium Alkylamine Adsorption on Si-OH and Si-H Surfaces
-
Kelly, M. J.; Han, J. H.; Musgrave, C. B.; Parsons, G. N. In-Situ Infrared Spectroscopy and Density Functional Theory Modeling of Hafnium Alkylamine Adsorption on Si-OH and Si-H Surfaces Chem. Mater. 2005, 17, 5305-5314
-
(2005)
Chem. Mater.
, vol.17
, pp. 5305-5314
-
-
Kelly, M.J.1
Han, J.H.2
Musgrave, C.B.3
Parsons, G.N.4
-
46
-
-
77956413575
-
Surface and Interface Processes during Atomic Layer Deposition of Copper on Silicon Oxide
-
Dai, M.; Kwon, J.; Halls, M. D.; Gordon, R. G.; Chabal, Y. J. Surface and Interface Processes During Atomic Layer Deposition of Copper on Silicon Oxide Langmuir 2010, 26, 3911-3917
-
(2010)
Langmuir
, vol.26
, pp. 3911-3917
-
-
Dai, M.1
Kwon, J.2
Halls, M.D.3
Gordon, R.G.4
Chabal, Y.J.5
-
48
-
-
70349900265
-
Remote Plasma Treatment of Si Surfaces: Enhanced Nucleation in Low-Temperature Chemical Vapor Deposition
-
Kumar, N.; Yanguas-Gil, A.; Daly, S. R.; Girolami, G. S.; Abelson, J. R. Remote Plasma Treatment of Si Surfaces: Enhanced Nucleation in Low-Temperature Chemical Vapor Deposition Appl. Phys. Lett. 2009, 95, 144107
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 144107
-
-
Kumar, N.1
Yanguas-Gil, A.2
Daly, S.R.3
Girolami, G.S.4
Abelson, J.R.5
-
50
-
-
84863411690
-
10 during Deposition of Thin Manganese Films on Silicon Oxide and on Copper Surfaces
-
10 During Deposition of Thin Manganese Films on Silicon Oxide and on Copper Surfaces J. Vac. Sci. Technol. A 2012, 30, 01A112
-
(2012)
J. Vac. Sci. Technol. A
, vol.30
-
-
Qin, X.1
Sun, H.2
Zaera, F.3
-
51
-
-
0035673331
-
In Situ Quadrupole Mass Spectrometry and Quartz Crystal Microbalance Studies on the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetrachloride and Water
-
Matero, R.; Rahtu, A.; Ritala, M. In Situ Quadrupole Mass Spectrometry and Quartz Crystal Microbalance Studies on the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetrachloride and Water Chem. Mater. 2001, 13, 4506-4511
-
(2001)
Chem. Mater.
, vol.13
, pp. 4506-4511
-
-
Matero, R.1
Rahtu, A.2
Ritala, M.3
-
52
-
-
0036685058
-
Viscous Flow Reactor with Quartz Crystal Microbalance for Thin Film Growth by Atomic Layer Deposition
-
Elam, J. W.; Groner, M. D.; George, S. M. Viscous Flow Reactor with Quartz Crystal Microbalance for Thin Film Growth by Atomic Layer Deposition Rev. Sci. Instrum. 2002, 73, 2981-2987
-
(2002)
Rev. Sci. Instrum.
, vol.73
, pp. 2981-2987
-
-
Elam, J.W.1
Groner, M.D.2
George, S.M.3
-
53
-
-
34447539779
-
Kinetic Measurements of Hydrocarbon Conversion Reactions on Model Metal Surfaces
-
Wilson, J.; Guo, H.; Morales, R.; Podgornov, E.; Lee, I.; Zaera, F. Kinetic Measurements of Hydrocarbon Conversion Reactions on Model Metal Surfaces Phys. Chem. Chem. Phys. 2007, 9, 3830-3852
-
(2007)
Phys. Chem. Chem. Phys.
, vol.9
, pp. 3830-3852
-
-
Wilson, J.1
Guo, H.2
Morales, R.3
Podgornov, E.4
Lee, I.5
Zaera, F.6
-
54
-
-
77957158989
-
Qualitative and Quantitative Analysis of Complex Temperature-Programmed Desorption Data by Multivariate Curve Resolution
-
Rodríguez-Reyes, J. C. F.; Teplyakov, A. V.; Brown, S. D. Qualitative and Quantitative Analysis of Complex Temperature-Programmed Desorption Data by Multivariate Curve Resolution Surf. Sci. 2010, 604, 2043-2054
-
(2010)
Surf. Sci.
, vol.604
, pp. 2043-2054
-
-
Rodríguez-Reyes, J.C.F.1
Teplyakov, A.V.2
Brown, S.D.3
-
55
-
-
65649130021
-
The Thermal Chemistry of Tetrakis(ethylmethylamido)titanium on Si(100) Surfaces
-
Kan, B.-C.; Boo, J.-H.; Lee, I.; Zaera, F. The Thermal Chemistry of Tetrakis(ethylmethylamido)titanium on Si(100) Surfaces J. Phys. Chem. A 2009, 113, 3946-3954
-
(2009)
J. Phys. Chem. A
, vol.113
, pp. 3946-3954
-
-
Kan, B.-C.1
Boo, J.-H.2
Lee, I.3
Zaera, F.4
-
56
-
-
65249169295
-
In Situ Infrared Characterization during Atomic Layer Deposition of Lanthanum Oxide
-
Kwon, J.; Dai, M.; Halls, M. D.; Langereis, E.; Chabal, Y. J.; Gordon, R. G. In Situ Infrared Characterization During Atomic Layer Deposition of Lanthanum Oxide J. Phys. Chem. C 2009, 113, 654-660
-
(2009)
J. Phys. Chem. C
, vol.113
, pp. 654-660
-
-
Kwon, J.1
Dai, M.2
Halls, M.D.3
Langereis, E.4
Chabal, Y.J.5
Gordon, R.G.6
-
57
-
-
0036661411
-
Infrared and Molecular Beam Studies of Chemical Reactions on Solid Surfaces
-
Zaera, F. Infrared and Molecular Beam Studies of Chemical Reactions on Solid Surfaces Int. Rev. Phys. Chem. 2002, 21, 433-471
-
(2002)
Int. Rev. Phys. Chem.
, vol.21
, pp. 433-471
-
-
Zaera, F.1
-
59
-
-
0036133019
-
Probing Catalytic Reactions at Surfaces
-
Zaera, F. Probing Catalytic Reactions at Surfaces Prog. Surf. Sci. 2001, 69, 1-98
-
(2001)
Prog. Surf. Sci.
, vol.69
, pp. 1-98
-
-
Zaera, F.1
-
60
-
-
52649095498
-
Molecular Surface Chemistry by Metal Single Crystals and Nanoparticles from Vacuum to High Pressure
-
Somorjai, G. A.; Park, J. Y. Molecular Surface Chemistry by Metal Single Crystals and Nanoparticles from Vacuum to High Pressure Chem. Soc. Rev. 2008, 37, 2155-2162
-
(2008)
Chem. Soc. Rev.
, vol.37
, pp. 2155-2162
-
-
Somorjai, G.A.1
Park, J.Y.2
|