Approach to control deposition of ultra thin films from metal organic precursors: Ru deposition

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9003-9008

  Igumenov, Igor K ^a   Semyannikov, Pyotr P ^a   Trubin, Sergei V ^a   Morozova, Natalia B ^a   Gelfond, Nikolay V ^a   Mischenko, Alexander V ^a   Norman, John A ^b  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

Atomic layer deposition; High temperature mass spectrometry; Ru(III) acetylacetonate; Ruthenium films

Indexed keywords

DECOMPOSITION; KINETIC PARAMETERS; PURGING; RUTHENIUM; THERMODYNAMIC STABILITY; ULTRATHIN FILMS;

PRECURSOR VAPOR; PULSE METHOD;

ATOMIC LAYER DEPOSITION;

ATOMIC LAYER DEPOSITION; DECOMPOSITION; KINETIC PARAMETERS; PURGING; RUTHENIUM; THERMODYNAMIC STABILITY; ULTRATHIN FILMS;

EID: 34547684711     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.129     Document Type: Article

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