Surface poisoning in the nucleation and growth of palladium atomic layer deposition with Pd(hfac)2 and formalin

Thin Solid Films

Volumn 519, Issue 16, 2011, Pages 5339-5347

  Goldstein, D N ^a   George, S M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b University of Colorado at Boulder   (United States)

Author keywords

Atomic layer deposition; Nucleation; Palladium; Surface chemistry

Indexed keywords

ACTIVATION BARRIERS; EX SITU; FORMALIN; FOURIER TRANSFORM INFRARED; FT-IR STUDY; HIGH SURFACE AREA; IN-SITU; NANO POWDERS; NUCLEATION AND GROWTH; OXIDE SUBSTRATES; OXIDE SURFACE; SECOND ORDER KINETICS; SURFACE POISONING; SURFACE SPECIES;

ACETONE; ADSORPTION; ALUMINUM; ATOMIC LAYER DEPOSITION; ATOMS; ECOLOGY; FORMALDEHYDE; FOURIER TRANSFORMS; HYDROXYLATION; LIGANDS; NANOCLUSTERS; NUCLEATION; SUBSTRATES; SURFACE CHEMISTRY; SURFACE REACTIONS; TRANSMISSION ELECTRON MICROSCOPY;

PALLADIUM;

EID: 79957971399     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.02.037     Document Type: Article

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