ALD of rhodium thin films from Rh(acac)3 and oxygen

Electrochemical and Solid-State Letters

Volumn 8, Issue 8, 2005, Pages

  Aaltonen, Titta ^a   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY; FILM GROWTH; OXYGEN; THICKNESS MEASUREMENT; THIN FILMS;

ATOMIC LAYER DEPOSITION (ALD); DEPOSITION CYCLES; PULSE TIME;

RHODIUM COMPOUNDS;

EID: 24344480024     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1940507     Document Type: Article

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