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Volumn PV 2005-05, Issue , 2005, Pages 354-359
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High purity iridium thin films depositions using the inorganic IrF 6
a
AIR LIQUIDE
(France)
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
IRIDIUM COMPOUNDS;
THERMAL EFFECTS;
ATOMIC LAYER DEPOSITION (ALD);
THERMAL CLEANING METHOD;
THIN FILMS;
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EID: 31844448110
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (8)
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References (8)
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