Substrate selectivity of ( tBu-Allyl)Co(CO) 3 during thermal atomic layer deposition of cobalt

Chemistry of Materials

Volumn 24, Issue 6, 2012, Pages 1025-1030

  Kwon, Jinhee ^a   Saly, Mark ^b   Halls, Mathew D ^c   Kanjolia, Ravindra K ^b   Chabal, Yves J ^a  

^a The University of Texas at Dallas   (United States)

^b SAFC Hitech   (United Kingdom)

^c Materials Design Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALD PRECURSOR; CATALYTIC HYDROGENATION; CATALYTIC TRANSFORMATION; CHEMICAL SPECIFICITY; COORDINATION SPHERE; DEPOSITION TEMPERATURES; H-TERMINATED SI SURFACES; HYDROGEN DONOR; HYDROXYL GROUPS; METALLIC BONDS; METALLIC COBALT; NUCLEATION REACTION; REACTION SITES; STRUCTURAL ANALOGUE; SUBSTRATE SELECTIVITY;

COBALT; HYDROGEN; HYDROGENATION; NUCLEATION; SILICON; SILICON COMPOUNDS;

ATOMIC LAYER DEPOSITION;

EID: 84859142179     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm2029189     Document Type: Article

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