Salicidation process using NiSi and its device application

Journal of Applied Physics

Volumn 81, Issue 12, 1997, Pages 8047-8051

  Deng, F ^a   Johnson, R A ^a   Asbeck, P M ^a   Lau, S S ^a   Dubbelday, W B ^b   Hsiao, T ^c   Woo, J ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b RDT and E Division   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001188981     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365410     Document Type: Article

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