Atomic layer epitaxy of copper: Growth and selectivity in the Cu(II)-2,2,6,6-tetramethyl-3,5-heptanedionate/H2 process

Journal of the Electrochemical Society

Volumn 145, Issue 8, 1998, Pages 2926-2931

  Mårtensson, Per ^a   Carlsson, Jan Otto ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EPITAXIAL GROWTH; GLASS; METALLIC FILMS; NUCLEATION; ORGANOMETALLICS; PLATINUM; PYROLYSIS; SUBSTRATES;

AREA SELECTIVE DEPOSITION; ATOMIC LAYER EPITAXY;

COPPER;

EID: 0032136810     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838738     Document Type: Article

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