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Volumn 21, Issue 41, 2011, Pages 16488-16493
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Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperatures
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Author keywords
[No Author keywords available]
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Indexed keywords
AFM;
CRYSTALLINE-TO-AMORPHOUS;
DENSITY REDUCTION;
FOUR-POINT PROBE MEASUREMENTS;
IRIDIUM OXIDES;
LOW TEMPERATURES;
OXYGEN-BASED PROCESS;
PHASE CHANGE;
XRD;
ATOMIC LAYER DEPOSITION;
DEPOSITION;
IRIDIUM;
IRIDIUM COMPOUNDS;
MOLECULAR OXYGEN;
OZONE;
OXIDE FILMS;
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EID: 80053985485
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/c1jm12245b Document Type: Article |
Times cited : (43)
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References (22)
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