메뉴 건너뛰기




Volumn 21, Issue 41, 2011, Pages 16488-16493

Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperatures

Author keywords

[No Author keywords available]

Indexed keywords

AFM; CRYSTALLINE-TO-AMORPHOUS; DENSITY REDUCTION; FOUR-POINT PROBE MEASUREMENTS; IRIDIUM OXIDES; LOW TEMPERATURES; OXYGEN-BASED PROCESS; PHASE CHANGE; XRD;

EID: 80053985485     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/c1jm12245b     Document Type: Article
Times cited : (43)

References (22)
  • 1
    • 0004028474 scopus 로고    scopus 로고
    • in, ed. H. S. Nalwa, Academic Press, San Diego, CA, 103-159
    • M. Ritala and M. Leskelä, in Handbook of Thin Film Materials, ed., H. S. Nalwa, Academic Press, San Diego, CA, 2001, vol. 1, pp. 103-159
    • (2001) Handbook of Thin Film Materials , vol.1
    • Ritala, M.1    Leskelä, M.2
  • 6
    • 80054009151 scopus 로고    scopus 로고
    • PhD thesis, University of Helsinki, Finland
    • T. Pilvi, PhD thesis, University of Helsinki, Finland, 2008, http://ethesis.helsinki.fi/en/
    • (2008)
    • Pilvi, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.