Atomic layer deposition of nickel by the reduction of preformed nickel oxide

Electrochemical and Solid-State Letters

Volumn 5, Issue 6, 2002, Pages

  Chae, Junghun ^a   Park, Hyoung Sang ^b   Kang, Sang Won ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Genitech Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DEPOSITION; GLUES; NICKEL; OXIDATION; REACTION KINETICS;

ATOMIC LAYER DEPOSITION (ALD);

THIN FILMS;

EID: 0036000908     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1475199     Document Type: Article

References (15)