Nonfluorinated volatile copper(I) 1,3-diketiminates as precursors for Cu metal deposition via atomic layer deposition

Inorganic Chemistry

Volumn 45, Issue 21, 2006, Pages 8480-8482

  Park, Kyung Ho ^a   Bradley, Alexander Z ^a   Thompson, Jeffery S ^a   Marshall, Will J ^a  

^a DUPONT COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33750329075     PISSN: 00201669     EISSN: None     Source Type: Journal    
DOI: 10.1021/ic061016e     Document Type: Article

References (27)

1. (a) Ritala, M.; Leskela, M. In Handbook of Thin Film Materials; Nalwa, H. S., Ed.; Academic Press: San Diego, CA, 2001; Vol. 1; pp 103-156.
2. (b) Elers, K.-K.; Blomber, T.; Peussa, M.; Aitchison, B.; Haukka, S.; Marcus, S. Chem. Vap. Deposition 2006, 12, 99.
3. (c) Leskela, M.; Ritala, M. Angew. Chem., Int. Ed. 2003, 42, 5548.
4. (d) Sneh, O.; Clark-Phelps, R. B.; Londergan, A. R.; Winkler, J.; Seidel, T. Thin Solid Films 2002, 402, 248.
5. (a) Bradley, A. Z.; Thompson, J. S.; Park, K.-H. Int. Appl. WO 2006/ 015225, 2006.
6. (b) Bradley, A. Z.; Thompson, J. S. Int. Appl. WO 2004/094689, 2004.
7. (c) Bradley, A. Z.; Thompson, J. S.; Thorn, D. L. U.S. Patent 69639578.
8. (a) Thompson, J. S.; Bradley, A. Z.; Park, K.-H.; Dobbs, K. D.; Marshall, W. J. Organometallics 2006, 25, 2712.
9. (b) Park, K.-H.; Marshall, W. J. J. Org. Chem. 2005, 70, 2075.
10. (c) Park, K.-H.; Marshall, W. J. J. Am. Chem. Soc. 2005, 127, 9330.
11. (a) Mocella, M. T. J. Fluorine Chem. 2003, 122, 87.
12. (b) Leska, M.; Ritala, M. Angew. Chem., Int. Ed. 2003, 42, 5548.
13. 2005 Edition of the International Technology Roadmap for Semiconductors; http://www.itrs.net/Links/2005ITRS/Home2005.
14. (a) Bollmann, D.; Merkel, R.; Klumpp, A. Microelectron. Eng. 1997, 37/38, 105 and reference cited therein,
15. (b) Chen, T. Y.; Omnés, L.; Vaisserman, J.; Doppelt, P. Inorg. Chim. Acta 2004, 357, 1299.
16. (c) Kim, Y. S.; Shimogaki, Y. J. Vac. Sci. Technol., A 2001, 19, 2642.
17. Banger, K. K.; Ngo, S. C.; Higashiya, S.; Claessen, R. U.; Bousman, K. S.; Lim, P. N.; Toscano, P. J.; Welch, J. T. J. Organomet. Chem. 2003, 678, 15.
18. (a) Dai, X.; Warren, T. H. J. Am. Chem. Soc. 2004, 126, 10085.
19. (b) Badiei, Y. M.; Warren, T. H. J. Organomet. Chem. 2005, 690, 5989.
20. (c) Dai, X.; Warren, T. H. Chem. Commun. 2001, 1998.
21. (a) Chatt, J.; Duncanson, L. A. J. Chem. Soc. 1953, 2939.
22. (b) Budzelaar, P. H. M.; Timmermans, P. J. J. A.; Mackor, A.; Baerends, E. J. J. Organomet. Chem. 1988, 331, 397.
23. Chung, Y.; Duerr, B. F.; McKelvey, T. A.; Nanjappan, P.; Czarnik, A. W. J. Org. Chem. 1989, 54, 1018.
24. (a) Li, Z.; Gordon, R. G. Chem. Vap. Deposition 2006, 12, 435.
25. (b) Li, Z.; Barry, S. T.; Gordon, R. G. Inorg. Chem. 2005, 44, 1728.
26. (c) Lim, B. S.; Rahtu, A.; Park, J.-S.; Gordon, R. G. Inorg. Chem. 2003, 42, 7951.
27. (d) Lim, B. S.; Rahtu, A.; Gordon, R. G. Nat. Mater. 2003, 2, 749.