A novel two-step MOCVD for producing thin copper films with a mixture of ethyl alcohol and water as the additive

Thin Solid Films

Volumn 498, Issue 1-2, 2006, Pages 43-49

  Lee, Hsin Hung ^a   Lee, Chiapyng ^a   Kuo, Yu Lin ^a   Yen, Yee Wen ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Copper (Cu); Cuprous oxide (Cu2O); Ethyl alcohol and water mixture; Metallization; Two step metal organic chemical vapor deposition (MOCVD)

Indexed keywords

ADDITIVES; COPPER; ETHANOL; GRAIN SIZE AND SHAPE; REDUCTION; SURFACE ROUGHNESS; THIN FILMS; WATER;

CUPROUS OXIDE; ETHYL ALCOHOL AND WATER MIXTURE; HEXAFLUOROACETYLACETONATE HYDRATE; TWO-STEP METAL-ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD);

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 30944439098     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.060     Document Type: Conference Paper

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