Low-Temperature Thermal CVD of Ti-Al Metal Films Using a Strong Reducing Agent

Chemical Vapor Deposition

Volumn 4, Issue 4, 1998, Pages 129-132

  Ludviksson, Audunn ^a   Nooney, Matthew ^a   Bruno, Robert ^a   Bailey, Alec ^b   Kodas, Toivo T ^a   Hampden Smith, Mark J ^b  

^a University of New Mexico   (United States)

^b UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGENTS; ASPECT RATIO; LOW TEMPERATURE OPERATIONS; METALLIC FILMS; REDUCTION; TITANIUM; TITANIUM COMPOUNDS;

REDUCING AGENTS;

CHEMICAL VAPOR DEPOSITION;

EID: 0032119697     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1521-3862(199807)04:04<129::aid-cvde129>3.3.co;2-a     Document Type: Article

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