Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature

Journal of Materials Research

Volumn 19, Issue 11, 2004, Pages 3353-3358

  Aaltonen, Titta ^a   Ritala, Mikko ^a   Tung, Yung Liang ^b   Chi, Yun ^b   Arstila, Kai ^a   Meinander, Kristoffer ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AIR; ALUMINA; ATOMIC FORCE MICROSCOPY; DEPOSITION; FILM GROWTH; IRIDIUM; OXYGEN; PALLADIUM; PLATINUM; RUTHENIUM; TEMPERATURE;

ATOMIC LAYER DEPOSITION; DEPOSITION TEMPERATURE; NOBLE METALS;

THIN FILMS;

EID: 11244346842     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2004.0426     Document Type: Article

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