Atomic layer deposition of platinum oxide and metallic platinum thin films from Pt(acac)2 and ozone

Chemistry of Materials

Volumn 20, Issue 21, 2008, Pages 6840-6846

  Hämäläinen, Jani ^a   Munnik, Frans ^b   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AMORPHOUS FILMS; ATOMIC PHYSICS; ATOMS; METALLIC COMPOUNDS; METALLIC SOAPS; OZONE; PHYSICAL VAPOR DEPOSITION; PLATINUM; PLATINUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS; THIN FILMS;

ADHESION LAYERS; ATOMIC LAYER DEPOSITION (ALD; ATOMIC LAYERS; FILM DEPOSITIONS; HIGHER TEMPERATURES; LOW TEMPERATURE LIMITS; NATIVE OXIDES; PLATINUM FILMS; PLATINUM OXIDES; PLATINUM THIN FILMS; POROUS PLATINUMS; PULSE LENGTHS; REDUCED PRESSURES; ROOM TEMPERATURES; SILICON SUBSTRATES; SODA LIMES; SUBLIMATION TEMPERATURES; THICK METALLIC FILMS; THICKNESS UNIFORMITIES;

OXIDE FILMS;

EID: 57049145260     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm801187t     Document Type: Article

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