Solution reactivity studies for identification of promising new ALD and pulsed-CVD reaction chemistries

ECS Transactions

Volumn 50, Issue 13, 2013, Pages 53-66

  Vidjayacoumar, B ^a   Ramalingam, V ^a   Emslie, D J H ^a   Blackwell, J M ^b   Clendenning, S B ^a  

^a MCMASTER UNIVERSITY   (Canada)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER COMPOUNDS; COPPER METALLOGRAPHY; NICKEL COMPOUNDS; SPECTROSCOPIC ANALYSIS;

COPPER METAL; METAL DEPOSITION; NICKEL PRECURSOR; PULSED CVD; REACTION CHEMISTRY; REACTION PATHWAYS; REACTIVITY STUDIES; SPECTROSCOPIC STUDIES;

ATOMIC LAYER DEPOSITION;

EID: 84883278523     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/05013.0053ecst     Document Type: Conference Paper

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