Mechanism for the atomic layer deposition of copper using diethylzinc as the reducing agent: A density functional theory study using gas-phase molecules as a model

Journal of Physical Chemistry A

Volumn 116, Issue 35, 2012, Pages 8893-8901

  Dey, Gangotri ^a   Elliott, Simon D ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER DEPOSITION; COPPER METAL; CU(HFAC)2; DIETHYLZINC; DISPROPORTIONATIONS; FIRST-PRINCIPLES DENSITY FUNCTIONAL THEORY; GAS PHASE MOLECULES; GAS-PHASE MECHANISM; INTERMEDIATE RESULTS; LIGAND EXCHANGES; METALLIC STATE; PARALLEL PATHWAYS; REDUCTIVE ELIMINATION; STERIC HINDRANCES; THEORETICAL STUDY; TRANSMETALATION;

ATOMIC LAYER DEPOSITION; CALCULATIONS; CHEMICAL BONDS; COPPER COMPOUNDS; DENSITY FUNCTIONAL THEORY; ELECTRONEGATIVITY; MOLECULES; ZINC; ZINC COMPOUNDS;

COPPER;

EID: 84865966619     PISSN: 10895639     EISSN: 15205215     Source Type: Journal    
DOI: 10.1021/jp304460z     Document Type: Article

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