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Volumn 12, Issue 11, 2009, Pages

Low temperature atomic layer deposition of ruthenium thin films using isopropylmethylbenzene-cyclohexadiene-ruthenium and O2

(9) Eom, Tae Kwang a Sari, Windu a Choi, Kyu Jeong b Shin, Woong Chul b Kim, Jae Hyun c Lee, Do Joong d Kim, Ki Bum d Sohn, Hyunchul e Kim, Soo Hyun a

a Yeungnam University (South Korea)

b NCD Technology (South Korea)

c Daegu Gyeongbuk Institute of Science and Technology (South Korea)

d Seoul National University (South Korea)

e Yonsei University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT HOLES; CYCLOHEXADIENES; CYCLOPENTADIENYLS; HIGH ASPECT RATIO; LOW TEMPERATURES; METHYLBENZENES; RU FILM; RU THIN FILMS; STEP COVERAGE; TRANSMISSION ELECTRON;

ASPECT RATIO; DEPOSITION; OLEFINS; ORGANOMETALLICS; RUTHENIUM; SILICON COMPOUNDS; THIN FILMS; TITANIUM NITRIDE; TOLUENE; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC LAYER DEPOSITION;

EID: 70249123822 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.3207867 Document Type: Article

Times cited : (68)

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