Plasma-enhanced atomic layer deposition of silver thin films

Chemistry of Materials

Volumn 23, Issue 11, 2011, Pages 2901-2907

  Kariniemi, Maarit ^a   Niinistö, Jaakko ^a   Hatanpää, Timo ^a   Kemell, Marianna ^a   Sajavaara, Timo ^b   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b UNIVERSITY OF JYVÄSKYLÄ   (Finland)

Author keywords

Plasma enhanced atomic layer deposition; plasmonics; silver diketonates; silver thin film

Indexed keywords

BEST CHOICE; EXPOSURE TIME; PLASMA EXPOSURE TIME; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; PLASMONICS; SILVER THIN FILM; SILVER THIN FILMS;

ATOMIC LAYER DEPOSITION; ATOMS; CRYSTAL IMPURITIES; CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC PROPERTIES; GROWTH RATE; PLASMA DEPOSITION; PLASMAS; THERMODYNAMIC PROPERTIES; THICK FILMS; THIN FILMS; VAPOR DEPOSITION;

SILVER;

EID: 79958782478     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm200402j     Document Type: Article

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